Photography Workshops & Travel Programs
The Guide to Photography Workshops & Travel Programs
Contrast Masking Photography Workshops
       
Website www.radekaphotography.com
Year Established 2005
Program Description Darkroom workshops for traditional B&W photographers that are devoted to contrast masking & other printing techniques
Number of Programs/Year 3 basic, 1 advanced
Program Length 3 days
Group Size or S:T Ratio 4:1
Program Focus Artistic Technique
Faculty Fine art photographer & author Lynn Radeka (Contrast Masking Kit and other publications)with over 40 years experience in fine-art photography.
Costs $600 for basic workshop, $600 for advanced workshop.
U.S. Locations Placentia, California
Months February, April, June, August, October
Contact Lynn Radeka
Photographer
Contrast Masking Photography Workshops
1249 Brian St.
Placentia, CA 92870
United States
E-Mail: lynn@radekaphotography.com

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Established in 2003 in NYC, PhotoManhattan offers an affordable means of entry and advance into the world of art and photography. We are committed to the idea of photography as an accessible means of personal expression and artistic documentation.

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